Single mask wafer overcoat process using photodefinable polyimide

Solid State Technology

Volumn 42, Issue 10, 1999, Pages 95-96

  Hall, Stephen ^a   Schuckert, Craig C ^a  

^a AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PASSIVATION; POLYIMIDES; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTODEFINABLE POLYIMIDE; SINGLE MASK WAFER OVERCOAT PROCESS;

SILICON WAFERS;

EID: 0033341755     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (0)