Characterization of lead zirconate titanate thin film deposition onto Pt/Ti/SiO2/Si substrates

Journal of Materials Science: Materials in Electronics

Volumn 10, Issue 7, 1999, Pages 551-556

  Chang, C C ^a   Chen, K H ^a  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ANNEALING; PERMITTIVITY; PEROVSKITE; PIEZOELECTRIC MATERIALS; PLATINUM; SEMICONDUCTING LEAD COMPOUNDS; SILICA; SILICON WAFERS; SPUTTER DEPOSITION; TITANIUM;

LEAD ZIRCONATE TITANATE;

DIELECTRIC FILMS;

EID: 0033340333     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008952823780     Document Type: Article

References (13)

1. L. S. PHILLIPS, Electron. Compon 12 (1971) 523.
2. MASARU OIKAWA and KOHJI TODA, Appl. Phys. Lett. 29 (1976) 491.
3. AKIRA OKADA, J. Appl. Phys. 48 (1977) 2905.
4. R. N. CASTELLANO and L. G. FEINSTEIN, ibid. 50 (1979) 4406.
5. WANG, A. PIGNOLET and F. LEVY, Mater Res. Bull. 25 (1990) 1495.
6. YUKIO SAKASHITA and HIDEO SEGAWA, J. Appl. Phys. 73 (1993) 7857.
7. M.TOYAMA, R. KUBO, E. TAKATA, K. TANAKA and K. OHWADA, Sens. Actuators A 45 (1994) 125.
8. O. AUCIELLO, J. Appl. Phys. 73 (1993) 5197.
9. J.FRANTTI and V. LANTTO, ibid. 76 (1994) 2139.
10. S. HORWITZ, K. S. GRABOWSKI, D. B. CHRISEY and R. E. LEUCHTNER, Appl. Phys. Lett. 59 (1991) 1565.
11. GUANGHUA YI, ZHENG WU and M. SAYER, J. Appl. Phys. 64 (1988) 2717.
12. R. N. CASTELLANO and L. G. FEINSTEIN, ibid. 50 (1979) 4406.
13. D. ROY, S. B. KRUPANIDHI and J. D. DOUGHERTY, J. Vac. Sci. Technol. A. 10 (1992) 18.