Ultra-shallow junctions and the effect of ramp-up rate during spike anneals in lamp-based and hot-walled RTP systems

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 22-25

  Agarwal, Aditya ^a   Fiory, Anthony T ^a   Gossmann, Hans J ^a   Rafferty, Conor ^a   Frisella, Peter ^a   Hebb, Jeff ^a   Jackson, John ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; ION IMPLANTATION; RAPID THERMAL ANNEALING; SEMICONDUCTING BORON; THERMAL EFFECTS;

RAPID THERMAL PROCESSING (RTP);

SEMICONDUCTOR JUNCTIONS;

EID: 0033339984     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)