Chemical effect of fluorine on boron transient enhanced diffusion

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 909-912

  Ishida, E ^a   Downey, D F ^a   Jones, K S ^a   Liu, J ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; COMPOSITION EFFECTS; DIFFUSION IN SOLIDS; FLUORINE; ION IMPLANTATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON; SEMICONDUCTOR DOPING; TRANSMISSION ELECTRON MICROSCOPY;

TRANSIENT ENHANCED DIFFUSION (TED);

SILICON WAFERS;

EID: 0033339967     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)