Applied Materials xR80S, xRLEAP and xR120S 300 mm ion implant systems

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 362-364

  Edwards, Peter ^a   Banks, Peter ^a   Beeston, Brian ^a   Cooke, Richard ^a   David, Andrew ^a   Naylor Smith, Richard ^a   Paffett, Geoffrey ^a   Boyd, Wendell ^a   Wagner, Dennis ^a  

^a Applied Materials   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; SEMICONDUCTOR JUNCTIONS;

BATCH SYSTEMS; PROCESS TRANSPARENCY;

ION IMPLANTATION;

EID: 0033338263     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)