Reduction of copper oxide thin films with hydrogen plasma generated by a dielectric-barrier glow discharge

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 11, 1999, Pages 6506-6511

  Sawada, Yasushi ^a   Taguchi, Noriyuki ^a   Tachibana, Kunihide ^b  

^a Advanced Technology Research Laboratory   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; GLOW DISCHARGES; HYDROGEN; LIGHT ABSORPTION; MATHEMATICAL MODELS; PLASMA DIAGNOSTICS; REDUCTION; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

DIELECTRIC-BARRIER GLOW DISCHARGES;

COPPER OXIDES;

EID: 0033337951     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6506     Document Type: Article

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