OH radical generation in a discharge plasma observed by a LIF method

Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)

Volumn 3, Issue , 1999, Pages 1461-1466

  Ono, Ryo ^a   Oda, Tetsuji ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DECAY RATE; HYDROXYL RADICAL; LASER INDUCED FLUORESCENCE; PULSED ARC DISCHARGE;

CURRENT DENSITY; DECOMPOSITION; ELECTRIC VARIABLES MEASUREMENT; EXCIMER LASERS; FLUORESCENCE; HYDROGEN; LASER APPLICATIONS; MOLECULES; NITROGEN OXIDES; OXIDATION; OXYGEN; PLASMAS;

ELECTRIC ARCS;

EID: 0033337197     PISSN: 01972618     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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