Laser manufacturing of precision SiC and Si components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3898, Issue , 1999, Pages 426-435

  Kreutz, Ernst W ^a   Weichenhain, Ruth ^a   Horn, Alexander ^a   Jandeleit, Juergen ^a   Pfleging, Wilhelm ^a   Poprawe, Reinhart ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DRY ETCHING; ELECTRON MICROSCOPY; INTERFEROMETRY; LASER BEAM EFFECTS; MASS SPECTROMETRY; MICROMACHINING; MICROSTRUCTURE; SEMICONDUCTOR LASERS; SILICON CARBIDE; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER MANUFACTURING; OPTICAL SPECTROSCOPY;

NEODYMIUM LASERS;

EID: 0033336319     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (27)