Plasma doping: Progress and potential

Solid State Technology

Volumn 42, Issue 9, 1999, Pages

  Chu, Paul K ^e   Felch, S B ^a   Kellerman, P ^b   Sinclair, F ^b   Larson, L A ^c   Mizuno, B ^d  

^a Varian Semiconduct Equipment Assoc   (United States)

^b EATON CORPORATION   (United States)

^c SEMATECH   (United States)

^d PANASONIC CORPORATION   (Japan)

^e CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; ION IMPLANTATION; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS;

BEAM-LINE ION IMPLANTATIONS; PLASMA DOPING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033335635     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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