Depth profiles of palladium-hydrogen complexes in silicon

Physica B: Condensed Matter

Volumn 273-274, Issue , 1999, Pages 429-432

  Weber, J ^a   Knack, S ^a   Sachse, J U ^a,b  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP LEVEL TRANSIENT SPECTROSCOPY; ETCHING; HYDROGEN; PALLADIUM;

WET CHEMICAL ETCHING;

SEMICONDUCTING SILICON;

EID: 0033335190     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)00497-4     Document Type: Article

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