Development of ZrSiO attenuated phase shift mask for ArF excimer laser lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 979-986

  Fukuhara, Nobuhiko ^a   Haraguchi, Takashi ^a   Kanayama, Koichiro ^a   Matsuo, Tadashi ^a   Takeuchi, Susumu ^a   Tomiyama, Kozue ^a   Saga, Tadashi ^a   Hattori, Yusuke ^a   Ooshima, Takashi ^a   Otaki, Masao ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION; DRY ETCHING; EXCIMER LASERS; LIGHT EXTINCTION; LIGHT REFLECTION; LIGHT TRANSMISSION; MULTILAYERS; OPTICAL FILMS; PHOTOLITHOGRAPHY; QUARTZ; REFRACTIVE INDEX; ZIRCONIUM COMPOUNDS;

EXTINCTION COEFFICIENT; PHASE SHIFTING MASKS (PSM);

MASKS;

EID: 0033332882     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373291     Document Type: Conference Paper

References (7)