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Volumn 433-435, Issue , 1999, Pages 849-853
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Adsorbate-substrate interaction in photofragmentation of trimethylsilylfluoride [Si(CH3)3F] adsorbed on Cu( 111) following Si K-shell excitation
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Author keywords
Desorption induced by electronic transitions; Inner shell photoexcitation; Layer thickness effect; Photon stimulated desorption (PSD); Trimethylsilylfluoride; X ray absorption near edge structures (XANES)
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Indexed keywords
ADSORPTION;
COPPER;
DESORPTION;
ELECTRON ENERGY LEVELS;
IONS;
PHOTOCHEMICAL REACTIONS;
SILICON COMPOUNDS;
SYNCHROTRON RADIATION;
ADSORBATE SUBSTRATE INTERACTION;
DESORPTION MASS SPECTRA;
ELECTRONIC TRANSITIONS;
EXCITATION ENERGY DEPENDENCY;
INNER SHELL PHOTOEXCITATION;
LAYER THICKNESS EFFECT;
PHOTOFRAGMENTATION;
PHOTON STIMULATED DESORPTION;
TRIMETHYLSILYLFLUORIDE;
X RAY ABSORPTION NEAR EDGE STRUCTURES;
SURFACE PHENOMENA;
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EID: 0033329444
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(99)00041-2 Document Type: Article |
Times cited : (15)
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References (11)
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