Target for a Pb(Zr,Ti)O3 thin film deposited at a low temperature using a quasi-metallic mode of reactive sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 12 A, 1999, Pages 6882-6886

  Kim, Je Deok ^a   Kawagoe, Shinya ^a   Sasaki, Kimihiro ^a   Hata, Tomonobu ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

Composite; Ferroelectric PZT thin film; High deposition rate; Low temperature; Powder and mixture targets; Quasi metallic mode reactive sputtering

Indexed keywords

CRYSTAL STRUCTURE; LOW TEMPERATURE OPERATIONS; MAGNETIC VARIABLES MEASUREMENT; PROBES; SPECIFIC HEAT; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYSIS; LEAD ZIRCONIUM TITANATE; QUASI METALLIC MODE REACTIVE SPUTTERING;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 0033328096     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.6882     Document Type: Article

References (5)

1. D. J. Taylor, P. K. Larsen and R. Cuppens: Appl. Phys. Lett. 64 (1994) 1392.
2. H. Ishiwara: Jpn. J. Appl. Phys. 32 (1993) 442.
3. W. A. Geideman: IEEE Trans. Ultrason. Ferroelectr. & Freq. Control 38 (1991) 704.
4. S. B. Krupanidhi, N. Maffei, M. Sayer and K. El-Assal: J. Appl. Phys. 54 (1983) 6601.
5. M. Sayer: Proc. 6th IEEE Int. Symp. Applications of Ferroelectrics (1986) p. 560.