Novel x-cut lithium niobate intensity modulator with 10 G bandwidth

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3847, Issue , 1999, Pages 102-109

  Miyama, Yasuyuki ^a   Sugamata, Tohru ^a   Hashimoto, Yoshihiro ^a   Sakamoto, Toshihiro ^a   Hirotoshi, Nagata ^a  

^a SUMITOMO OSAKA CEMENT CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; LITHIUM NIOBATE; PLASMA ETCHING; SILICA; WAVELENGTH DIVISION MULTIPLEXING;

BUFFER LAYERS; DRIVING VOLTAGE; ETCHING PATTERNS;

LIGHT MODULATORS;

EID: 0033327872     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)