OH radical generation by atmospheric pressure plasma and its quantitative analysis by monitoring CO oxidation

Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)

Volumn 3, Issue , 1999, Pages 1473-1477

  Su, Zhenzhou ^a   Kim, Hyun Ha ^a   Tsutsui, Masashi ^a   Takashima, Kazunori ^a   Mizuno, Akira ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROXYL RADICAL; PLASMA PROCESS; PULSE DISCHARGE PLASMA; SPECIFIC INPUT ENERGY;

ARGON; ATMOSPHERIC PRESSURE; CARBON DIOXIDE; CARBON MONOXIDE; CHEMICAL ANALYSIS; DECOMPOSITION; ELECTRIC DISCHARGES; HYDROGEN; OXIDATION; OXYGEN; THERMAL EFFECTS; WATER;

PLASMA APPLICATIONS;

EID: 0033327527     PISSN: 01972618     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

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