Extending ellipsometry capabilities for ultra-thin gate oxide metrology using rapid optical surface treatment technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3882, Issue , 1999, Pages 126-131

  Tardif, Francois ^a   Danel, Adrien ^a   Kamieniecki, Emil ^a   Harrington, James ^a  

^a CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); IMPURITIES; INTEGRATED CIRCUIT MANUFACTURE; MEASUREMENT ERRORS; ORGANIC COMPOUNDS; OXIDES; STATISTICAL PROCESS CONTROL; SURFACE TREATMENT; YIELD STRESS;

FILM THICKNESS; RAPID OPTICAL SURFACE TREATMENT TECHNOLOGY; ULTRA THIN GATE OXIDE METROLOGY;

ELLIPSOMETRY;

EID: 0033327329     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.361300     Document Type: Conference Paper

References (7)