Characterisation of ZnS:Mn thin films by Rietveld refinement of Bragg-Brentano X-ray diffraction patterns

Thin Solid Films

Volumn 353, Issue 1, 1999, Pages 129-136

  Tagliente, M A ^a   Penza, M ^a   Gusso, M ^a   Quirini, A ^a  

^a Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; EVAPORATION; MAGNETRON SPUTTERING; STRUCTURE (COMPOSITION); THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

BRAGG-BRENTANO X RAY DIFFRACTION PATTERNS; RIETVELD METHOD; THERMAL VACUUM EVAPORATION;

SEMICONDUCTING FILMS;

EID: 0033327323     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00395-8     Document Type: Article

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