|
Volumn 12, Issue 3, 1999, Pages 375-377
|
An iterative cutting procedure for determining the optimal wafer exposure pattern
|
Author keywords
Algorithms; Cutting; Optimization methods; Wafer exposure; Yield optimization
|
Indexed keywords
ALGORITHMS;
COMPUTER SOFTWARE;
CUTTING;
EXPERT SYSTEMS;
ITERATIVE METHODS;
OPTIMIZATION;
SILICON WAFERS;
ASM WAFER STEPPER;
WAFER EXPOSURE;
YIELD OPTIMIZATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
|
EID: 0033326954
PISSN: 08946507
EISSN: None
Source Type: Journal
DOI: 10.1109/66.778206 Document Type: Article |
Times cited : (18)
|
References (4)
|