Comparison of global nonlinear models and 'model-on-demand' estimation applied to identification of a RTP wafer reactor

Proceedings of the IEEE Conference on Decision and Control

Volumn 4, Issue , 1999, Pages 3950-3955

  Braun, M W ^a   Rivera, D E ^a   Stenman, A ^a   Foslien, W ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTER SIMULATION; NEURAL NETWORKS; NONLINEAR CONTROL SYSTEMS; OPTIMIZATION; PARAMETER ESTIMATION; SEMICONDUCTOR DEVICE MANUFACTURE; TEMPERATURE; THERMODYNAMICS;

GLOBAL NONLINEAR MODELS; MODEL ON DEMAND; RAPID THERMAL PROCESSING REACTOR; WAFER REACTOR;

TEMPERATURE CONTROL;

EID: 0033325157     PISSN: 01912216     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)