Study of natural oxidation of ultra-thin aluminum layers with in-situ resistance measurement

Materials Research Society Symposium - Proceedings

Volumn 569, Issue , 1999, Pages 185-190

  Fery, C ^a   Bailey, W E ^a   Yamada, K ^a   Wang, S X ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DIFFUSION IN SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON SCATTERING; FILM GROWTH; INTERFACES (MATERIALS); OXIDATION; OXYGEN; SPUTTER DEPOSITION;

ALUMINUM FILM; ALUMINUM VACUUM INTERFACE; FILM THICKNESS; ION BEAM SPUTTERING;

ULTRATHIN FILMS;

EID: 0033324364     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-569-185     Document Type: Conference Paper

References (12)