Role of surface pre-treatment in the CVD of diamond films on copper

Thin Solid Films

Volumn 355, Issue , 1999, Pages 162-166

  Ali, N ^a   Fan, Q H ^b   Ahmed, W ^a   Hassan, I U ^a   Rego, C A ^a   O' Hare, I P ^c  

^a MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; COPPER; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; METHANE; MORPHOLOGY; NUCLEATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; ULTRASONIC CLEANING;

BIAS-ENHANCED NUCLEATION (BEN); HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIAMOND FILMS;

EID: 0033323980     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00483-6     Document Type: Article

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