Evaluation of high dose ion implantation by spectroscopic ellipsometry

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 465-467

  Shibata, Satoshi ^a   Nambu, Yuko ^a   Etoh, Ryuji ^a   Fuse, Genshu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; MATHEMATICAL MODELS; MONTE CARLO METHODS; OSCILLATORS (ELECTRONIC); SPECTROSCOPIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

HIGH DOSE ION IMPLANTATION; SPECTROSCOPIC ELLIPSOMETRY;

ION IMPLANTATION;

EID: 0033323597     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)