Modeling the as-implanted distribution of antimony and indium

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 740-743

  Rendon, Michael J ^a   Zeitzoff, Peter ^a   Ravi, Sanjay ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIMONY; CMOS INTEGRATED CIRCUITS; INDIUM; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING;

CHANNEL IMPLANTS;

ION IMPLANTATION;

EID: 0033323564     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)