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Volumn 259, Issue 1-3, 1999, Pages 81-86

Development of a wide-temperature range VUV and UV spectrophotometer and its applications to silica glass

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BAND STRUCTURE; DEFECTS; FUSED SILICA; HIGH TEMPERATURE EFFECTS; OPTICAL GLASS; PHOTONS; RADIATION DAMAGE; THERMODYNAMIC STABILITY; VACUUM TECHNOLOGY;

EID: 0033323533     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00499-8     Document Type: Article
Times cited : (10)

References (18)
  • 15
    • 0043015638 scopus 로고
    • in Japanese
    • For example, see N. Kuzuu, Rev. Laser Eng. 23 (1995) 396 (in Japanese).
    • (1995) Rev. Laser Eng. , vol.23 , pp. 396
    • Kuzuu, N.1
  • 16
    • 0003174396 scopus 로고
    • J.I. Pankove (Ed.), ch. 2, Academic Press, New York
    • For review, see G.D. Cody, in: J.I. Pankove (Ed.), Semiconductors and Semimetals, vol. 21, ch. 2, Academic Press, New York, 1984.
    • (1984) Semiconductors and Semimetals , vol.21
    • Cody, G.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.