Rejection of P+ contamination in P++ implants on the 8250

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 622-625

  Rathmell, Robert D ^a   King, Monty L ^a   Kamenitsa, Dennis E ^a   Rathmell, Mark A ^a  

^a EATON CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTROSTATIC LENSES; MAGNETIC FIELDS; MASS TRANSFER; PHOSPHORUS; RIGIDITY; SECONDARY ION MASS SPECTROMETRY; TRANSPORT PROPERTIES;

ELECTROSTATIC RIGIDITY; MASS ANALYSIS MAGNETS; REFLECTIVE ENERGY FILTERS (REF);

ION IMPLANTATION;

EID: 0033323067     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)