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Volumn 1, Issue , 1999, Pages 130-133
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Evolution of void layers induced by multiple He implants
a a a a
a
CNR IMETEM
(Italy)
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
HELIUM;
SILICON WAFERS;
THERMAL EFFECTS;
VOID LAYERS;
ION IMPLANTATION;
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EID: 0033323031
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (7)
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