Review of analytical techniques for process control of contaminants introduced during ion implantation

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 626-629

  Biswas, Sukanta ^a   Kelly, Ian ^a   Chia, Victor K F ^a   Lindley, Patricia ^a   Edgell, Michael J ^a  

^a BRUNEL UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORESCENCE; IMPURITIES; PROCESS CONTROL; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SILICON WAFERS;

TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF); VAPOR PHASE DECOMPOSITION (VPD) PROCESS;

ION IMPLANTATION;

EID: 0033322446     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)