Inspection optimization for excursion and baseline defect monitoring in a manufacturing environment

1999 IEEE International Symposium on Semiconductor Manufacturing, ISSM 1999 - Conference Proceedings

Volumn , Issue , 1999, Pages 371-374

  Sajoto, D ^a   Gordon, A ^a   McCauley, A ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; MANUFACTURE; SEMICONDUCTOR DEVICE MANUFACTURE; CRYSTAL DEFECTS; ETCHING; INSPECTION; INSPECTION EQUIPMENT; OPTIMIZATION;

DEFECT MONITORING; END-OF-LINE; INSPECTION OPTIMIZATION; LINE DEFECTS; MANUFACTURING ENVIRONMENTS;

INSPECTION; SEMICONDUCTOR DEVICE MANUFACTURE;

METAL ETCH MODULES;

EID: 0033321252     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSM.1999.808813     Document Type: Conference Paper

References (1)

1. Hyperview is a yicld analysis software package by Heuristic Physics Laboratories, Inc. (HlL)