Real-time estimation of patterned wafer parameters using in situ spectroscopic ellipsometry

IEEE Conference on Control Applications - Proceedings

Volumn 1, Issue , 1999, Pages 773-778

  Galarza, Cecilia G ^a   Khargonekar, Pramod P ^a   Terry Jr , Fred L ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CALIBRATION; ELLIPSOMETRY; MATHEMATICAL MODELS; NONLINEAR CONTROL SYSTEMS; PARAMETER ESTIMATION; REAL TIME SYSTEMS; SEMICONDUCTOR DEVICE MANUFACTURE; SENSITIVITY ANALYSIS; SILICON WAFERS; STATE ESTIMATION;

AUTOMATIC MODEL CALIBRATION ALGORITHMS; PATTERNED WAFERS; SPECTROSCOPIC ELLIPSOMETRY;

PROCESS CONTROL;

EID: 0033321244     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)