Measurement of residual particles by high-intensity aerial ultrasonic waves

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 5 B, 1999, Pages 3312-3315

  Ito, Youichi ^a   Nakayama, Satoshi ^b   Miwa, Ryohei ^b  

^a NIHON UNIVERSITY   (Japan)

^b KURITA WATER INDUSTRIES LTD   (Japan)

Author keywords

Cleannes; High intensity aerial ultrasonic; Peeling off; Residual particles; Semiconductor manufacturing jigs; Surface cleaning; Waves

Indexed keywords

PARTICLES (PARTICULATE MATTER); SEMICONDUCTOR DEVICE MANUFACTURE; ULTRASONIC WAVES;

AERIAL ULTRASONIC WAVES; RESIDUAL PARTICLES;

ULTRASONIC CLEANING;

EID: 0033320776     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.3312     Document Type: Article

References (1)

1. Y. Ito: J. Acoust. Soc. Jpn. 46 (1990) 383 [in Japanese].