ZrSiO, a new and robust material for attenuated phase-shift masks in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 337-343

  Onodera, Toshio ^a   Matsuo, Takahiro ^a   Nakazawa, Keisuke ^a   Miyazaki, Junji ^a   Ogawa, Tohru ^a   Morimoto, Hiroaki ^a   Haraguchi, Takashi ^a   Fukuhara, Nobuhiko ^a   Matsuo, Tadashi ^a   Otaki, Masao ^a   Takeuchi, Susumu ^a  

^a NeTech Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; IRRADIATION; LASER BEAM EFFECTS; LITHOGRAPHY; OPACITY; QUARTZ APPLICATIONS; SPUTTER DEPOSITION; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

ABSORPTIVE FILM; ATTENUATED PHASE SHIFT MASK; MASK ERROR FACTOR; TRANSPARENT FILM; ZIRCONIUM SILICON OXIDE;

MASKS;

EID: 0033320004     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)