Noise reduction in the recording of holographic masks in photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3879, Issue , 1999, Pages 214-223

  Cescato, Lucila ^a   Soares, Leandro L ^a   Rigon, Elso L ^a   Alves, Marco A R ^a   Braga, Edmundo S ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; DIFFRACTIVE OPTICS; HOLOGRAPHIC OPTICAL ELEMENTS; LITHOGRAPHY; MASKS; NOISE ABATEMENT; OPTICAL RECORDING; REACTIVE ION ETCHING;

HOLOGRAPHIC MASKS; NOISE REDUCTION; PHASE PERTURBATIONS;

PHOTORESISTS;

EID: 0033319905     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)