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Volumn 3881, Issue , 1999, Pages 2-7
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Scaling the gate dielectric
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Author keywords
[No Author keywords available]
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Indexed keywords
DIELECTRIC MATERIALS;
ELECTRON TUNNELING;
GATES (TRANSISTOR);
INTERFACES (MATERIALS);
MOSFET DEVICES;
PERMITTIVITY;
RELIABILITY;
SILICA;
TANTALUM COMPOUNDS;
THERMODYNAMIC STABILITY;
TITANIUM COMPOUNDS;
DENSITY (SPECIFIC GRAVITY);
TITANIUM DIOXIDE;
DIELECTRIC SCALING;
GATE DIELECTRIC;
INTERFACE STATE DENSITY;
MICROELECTRONIC PROCESSING;
DIELECTRIC MATERIALS;
GATES (TRANSISTOR);
GATE DIELECTRIC;
INTERFACE STATE DENSITY;
SCALING;
DIELECTRIC SCALING;
GATE DIELECTRICS;
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EID: 0033319488
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.360539 Document Type: Conference Paper |
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Times cited : (2)
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References (3)
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