New optical sensor for real time in-situ end point monitoring during dry etching of III-V ternary multi stack layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3882, Issue , 1999, Pages 300-308

  Liddane, Kevin ^a   Benferhat, Ramdane ^a   Lee, Jewon ^a   Westerman, R ^a   Johnson, Dave ^a   Donohue, John F ^a   Sasserath, Jay N ^a   Pearton, S J ^a  

^a Instruments SA Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTROSCOPY; INTEGRATED CIRCUIT MANUFACTURE; INTERFEROMETRY; LIGHT ABSORPTION; OPTICAL SENSORS; PROCESS CONTROL; SEMICONDUCTING GALLIUM ARSENIDE;

END POINT CONTROL; LASER INTERFEROMETER; WAFER FABRICATION EQUIPMENT;

DRY ETCHING;

EID: 0033319307     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.361321     Document Type: Conference Paper

References (22)