Surface microroughness observed during wet etching of silicon dioxide with high electric field stress

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 12 A, 1999, Pages

  Yamabe, Kikuo ^a   Kai, Liao ^a   Murata, Masahide ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC FIELD EFFECTS; ETCHING; MICROSTRUCTURE; SILICA; SURFACE ROUGHNESS;

ELECTRIC FIELD STRESS; WET ETCHING;

DIELECTRIC FILMS;

EID: 0033318760     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1453     Document Type: Article

References (19)