Use of programmed multilayer defects in validating a defect compensation strategy for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 838-843

  Ray Chaudhuri, A K ^a   Cardinale, G ^a   Fisher, A ^a   Mangat, P J S ^a   Liang, S ^a   Sweeney, D W ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; MULTILAYERS; PHOTOLITHOGRAPHY;

EXTREME ULTRAVIOLET LITHOGRAPHY;

MASKS;

EID: 0033318695     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373378     Document Type: Conference Paper

References (10)