Characterization of reactive ion etching of sol-gel SiO2 using Taguchi optimization method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3896, Issue , 1999, Pages 438-444

  Wee, Terence C L ^a   Ooi, Boon Siew ^a   Zhou, Yan ^a   Chan, Yuen Chuen ^a   Lam, Yee Loy ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DRY ETCHING; MIXTURES; OPTIMIZATION; PLASMAS; REACTIVE ION ETCHING; SILICA; SOL-GELS; STATISTICAL METHODS;

CHAMBER PRESSURE; PHOTONICS INTEGRATED CIRCUITS; RADIOFREQUENCY POWER; TAGUCHI TECHNIQUE;

THIN FILMS;

EID: 0033317449     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.370344     Document Type: Conference Paper

References (4)