Effect of annealing on dielectric dispersion of tantalum oxide films prepared by RF sputtering

Conference on Electrical Insulation and Dielectric Phenomena (CEIDP), Annual Report

Volumn 1, Issue , 1999, Pages 62-65

  Itoh, Eiji ^a   Maki, Keigo ^a   Miyairi, Keiichi ^a  

^a SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIELECTRIC LOSSES; ELECTRIC POTENTIAL; FILM PREPARATION; LEAKAGE CURRENTS; PERMITTIVITY; POLARIZATION; SPUTTERING; TANTALUM COMPOUNDS; TEMPERATURE MEASUREMENT;

INTERFACIAL POLARIZATION; MAXWELL-WAGNER MECHANISM; TANTALUM OXIDE FILMS;

DIELECTRIC FILMS;

EID: 0033317191     PISSN: 00849162     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)