Damage control during dry etching of EUV mask - 1 - control of surface roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue , 1999, Pages

  Hoshino, Eiichi ^a   Ogawa, Taro ^a   Takahashi, Masashi ^a   Hoko, Hiromasa ^a   Yamanashi, Hiromasa ^a   Hirano, Naoya ^a   Okazaki, Shinji ^a  

^a Atsugi Research Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON COMPOUNDS; CHLORINE; DRY ETCHING; MULTILAYERS; PHOTOLITHOGRAPHY; SILICA; SUBSTRATES; SURFACE ROUGHNESS; TANTALUM;

EXTREME-ULTRAVIOLET LITHOGRAPHY (EUVL) MASK;

MASKS;

EID: 0033316555     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)