Optimal double-gate MOSFETs: Symmetrical or asymmetrical gates?

IEEE International SOI Conference

Volumn , Issue , 1999, Pages 98-99

  Kim, Keunwoo ^a   Fossum, Jerry G ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; MOSFET DEVICES; SEMICONDUCTING SILICON; THRESHOLD VOLTAGE;

DOUBLE-GATE COMPLEMENTARY METAL OXIDE SEMICONDUCTOR (DG CMOS);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033313977     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)