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Volumn 1, Issue , 1999, Pages 468-473
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Progress in ion implantation technology for advanced ULSI device fabrication
a
a
NEC CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
INTEGRATED CIRCUIT MANUFACTURE;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR JUNCTIONS;
ULSI CIRCUITS;
JUNCTION FORMATION METHOD;
ION IMPLANTATION;
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EID: 0033313576
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (1)
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References (20)
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