Investigation of the valence band states of reactively sputtered carbon nitride films

Thin Solid Films

Volumn 355, Issue , 1999, Pages 79-84

  Monclus, M A ^a   Cameron, D C ^a   Chowdhury, A K M S ^c   Barkley, R ^b   Collins, M ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BAND STRUCTURE; BINDING ENERGY; CHEMICAL BONDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON SPIN RESONANCE SPECTROSCOPY; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NITRIDES; SPUTTER DEPOSITION; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; OPPOSED TARGET REACTIVE SPUTTERING; ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY (UPS);

AMORPHOUS FILMS;

EID: 0033313357     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00512-X     Document Type: Article

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