Narrow CoSi2 line formation on SiO2 by focused ion beam

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 861-864

  Matsushita, A ^a   Sadoh, T ^a   Tsurushima, T ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; HYDROGEN PEROXIDE; ION BEAMS; ION BOMBARDMENT; NITRIC ACID; PHOSPHORIC ACID; SEMICONDUCTING SILICON COMPOUNDS; SILICA;

COBALT SILICIDE; FOCUSED ION BEAMS (FIB);

SEMICONDUCTING FILMS;

EID: 0033312456     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)