Oxidation behavior of NBD 200 silicon nitride ceramics

Journal of the American Ceramic Society

Volumn 82, Issue 8, 1999, Pages 2260-2262

  Mukundhan, Priya ^a   Wu, Jianqing ^a,b   Du, Henry H ^a  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DIFFUSION IN SOLIDS; ENERGY DISPERSIVE SPECTROSCOPY; GRAIN BOUNDARIES; GROWTH (MATERIALS); MAGNESIA; MORPHOLOGY; OXIDATION; SCANNING ELECTRON MICROSCOPY; SINTERING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELEMENTAL MAPPING; ION BEAM RASTERING; OXIDE GROWTH; PARABOLIC RATE LAW;

SILICON NITRIDE;

EID: 0033312026     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb02074.x     Document Type: Article

References (7)

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