Effect of the pattern structures on the charging damage during metal etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 57-60

  Hasegawa, Akihiro ^a   Aoyama, Masaaki ^a   Ishida, Toshiyuki ^a   Nakamura, Moritaka ^a   Hashimoto, Koichi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGING DAMAGE; ELECTRON SHADING EFFECT; GATE OXIDE; METAL ETCHING;

DEFECTS; ELECTRIC CURRENTS; GATES (TRANSISTOR); MOSFET DEVICES; OXIDES; THRESHOLD VOLTAGE;

PLASMA ETCHING;

EID: 0033311949     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)