Evaluation and reduction of electron shading damage in high temperature etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1999, Pages 29-32

  Nojiri, K ^a   Kato, K ^a   Kawakami, H ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ELECTRIC FIELD EFFECTS; ELECTRONS; GATES (TRANSISTOR); HIGH TEMPERATURE EFFECTS; MASKS; MOSFET DEVICES; SILICON WAFERS;

ELECTRON SHADING DAMAGE; ELECTRON TEMPERATURE; HIGH TEMPERATURE ETCHING;

PLASMA ETCHING;

EID: 0033311948     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (5)