Surface/Bulk Micromachining (SBM) process and deep trench oxide isolation method for MEMS

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1999, Pages 701-704

  Lee, Sangwoo ^a   Park, Sangjun ^a   Cho, Dong il Dan ^a   Oh, Yongsoo ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CAPACITANCE; CRYSTALLOGRAPHY; MICROMACHINING; OXIDES; REACTIVE ION ETCHING; SILICON WAFERS; SINGLE CRYSTALS;

COMB DRIVE ACTUATOR; DEEP TRENCH OXIDE ISOLATION METHOD; SURFACE BULK MICROMACHINING PROCESS;

MICROELECTROMECHANICAL DEVICES;

EID: 0033311568     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)