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Volumn 3, Issue , 1999, Pages 1621-1626
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Mask-under-etch experiments of Si{110} in TMAH
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Author keywords
[No Author keywords available]
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Indexed keywords
AMMONIUM COMPOUNDS;
COMPOSITION;
CRYSTAL MICROSTRUCTURE;
ETCHING;
OPTICAL MICROSCOPY;
OXIDES;
SCANNING ELECTRON MICROSCOPY;
SURFACES;
ETCHANT;
INCLINATION ANGLE;
TETRAMETHYLAMMONIUM HYDROXIDE;
WAGON WHEEL PATTERN;
SILICON WAFERS;
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EID: 0033310426
PISSN: 08407789
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (15)
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