In-line monitoring of chemical-mechanical polishing processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3884, Issue , 1999, Pages 24-35

  Hetherington, Dale L ^a   Stein, David J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; FRICTION; INTERFEROMETRY; MONITORING; OPTICAL SENSORS; PROCESS CONTROL; THERMAL EFFECTS; THICKNESS MEASUREMENT; VIBRATION MEASUREMENT;

CHEMICAL MECHANICAL POLISHING; ENDPOINT; IN LINE MONITORING; MOTOR TORQUE SENSING TECHNIQUE; PAD TEMPERATURE SENSING TECHNIQUE; PLANARIZATION; VIBRATION SENSING SYSTEM;

MICROELECTRONIC PROCESSING;

EID: 0033310280     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (37)