Compact column design for a focused ion beam lithography system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3777, Issue , 1999, Pages 175-182

  Ji, Qing ^a   King, Tsu Jae ^a   Lee, Yvette Y ^a   Leung, Ka Ngo ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; CHARGED PARTICLES; COMPUTER SOFTWARE; ELECTROSTATIC ACCELERATORS; ION BEAMS; OPTICAL COLLIMATORS; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; OPTICAL SYSTEMS; OXIDES; PARTICLE OPTICS; PLASMA SOURCES;

COMPACT COLUMN DESIGN; DEPLECTOR; FOCUSED ION BEAM LITHOGRAPHY SYSTEM; ION OPTICS;

ION BEAM LITHOGRAPHY;

EID: 0033310199     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)